公开(公告)号：US11602490B2

公开(公告)日：2023-03-14

申请号：US17032335

申请日：2020-09-25

Applicant: SHOFU INC.

Inventor： Naoya Kitada ,  Rei Nishimura ,  Hiroyuki Kobayashi ,  Kenzo Yamamoto

IPC: A61K6/30 ,  C08K5/5419 ,  C08L33/10 ,  C08L81/08

Abstract: To provide one liquid type dental adhesive composition that exhibits excellent adhesive property to glass ceramics, oxide-base ceramics and tooth substance, and has excellent storage stability, which are contrary features. One liquid type dental adhesive composition contains (a) silane coupling agent represented by general formula (1), (b) acidic group-containing polymerizable monomer, (c) volatile organic solvent, and (d) water. (In the formula, R1 represents an organic group having at least one functional group selected from the group consisting of a (meth)acryloyl group, a vinyl group and an epoxy group, R2 represents C4-C8 linear alkyl group, R3 represents C1-C8 alkyl group, and n is integer selected from 1 to 3.)

公开(公告)号：US11622916B2

公开(公告)日：2023-04-11

申请号：US17201118

申请日：2021-03-15

Applicant: SHOFU INC.

Inventor： Kenzo Yamamoto ,  Hiroyuki Kobayashi ,  Daisuke Hara ,  Shunsuke Miyata

IPC: C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  A61K6/62 ,  A61K6/71 ,  A61K6/78 ,  A61K6/30 ,  A61K6/831 ,  A61K6/887 ,  A61K6/61 ,  C08F220/28 ,  C08F220/32 ,  C08K5/00 ,  C08K5/08 ,  C08K5/14 ,  C08K5/17

Abstract: [Problem]
To provide a photocurable composition having a high curing depth.
[Solution]
To provide a photocurable composition of the present disclosure comprises (A) polymerizable monomer, (B) photosensitizer, (C) photoacid generator, and (D) photopolymerization accelerator, wherein, the photocurable composition comprises (D-1) amine compound represented by formula (1) as the (D) photopolymerization accelerator. (In the formula (1), R1 is a substituent represented by formula (2), and R2 and R3 are substituents represented by formula (2) or substituents selected from —OH group, —O— group, —S— group, —NH—C(O)—NH— group, —C(O)—O— group, —OC(O)— group, —OC(O)—NH— group, —NH—C(O)—O— group, halogen, an organic group which may have an alkoxysilyl group, an aromatic ring which may have a substituent and an alicyclic heterocycle which may have a substituent. Further, R2 and R3 may be H when at least one or more R4s of the formula (2) are an aromatic ring, and R3 may be H when R2 is a substituent represented by the formula (2)).