公开(公告)号：US20160003789A1

公开(公告)日：2016-01-07

申请号：US14749682

申请日：2015-06-25

Applicant: SIEMENS AKTIENGESELLSCHAFT

Inventor： Gerit EBELSBERGER ,  Holger Hackstein ,  Erhard Magori

IPC: G01N33/00 ,  F23R3/00

CPC classification number: G01N33/004 ,  F23R3/002 ,  G01N1/2226 ,  G01N1/2247

Abstract: A sensor apparatus for analyzing a gas in a process chamber, having a housing, a gas sensor for analyzing at least a part of the gas, the gas sensor being arranged at a determined position in the housing, a gas feed for connecting the housing to the process chamber to feed the part of the gas from the process chamber into the housing and to the determined position, and a gas discharge for discharging the gas from the housing, wherein the gas feed and the gas discharge are configured as tubes lying inside one another, characterized by a closure cap at the combustion chamber-side end of the tubes lying inside one another, the closure cap including an even number of at least four openings with the same area, which are connected alternately as a gas inlet and a gas outlet to the tubes lying inside one another is provided.

Abstract translation: 一种用于分析处理室中的气体的传感器装置，具有壳体，用于分析气体的至少一部分的气体传感器，气体传感器布置在壳体中的确定位置处，气体供给装置用于将壳体连接到 所述处理室将所述气体的一部分从所述处理室供给到所述壳体和所述确定位置，以及用于从所述壳体排出气体的气体放电，其中所述气体进料和所述气体排出构造为位于一个内部的管 另一个特征在于在彼此相对的管的燃烧室侧端部处的封闭盖，封闭盖包括偶数个具有相同面积的至少四个开口，其交替地连接作为气体入口和气体 提供了彼此相对置的管的出口。