METHOD FOR FORMING BUMP OF SEMICONDUCTOR PACKAGE

    公开(公告)号:US20180174990A1

    公开(公告)日:2018-06-21

    申请号:US15629234

    申请日:2017-06-21

    IPC分类号: H01L23/00

    摘要: The present invention provides a method for forming bumps of a semiconductor package to suppress a final height difference between main bumps and support bumps that is caused by a height difference between areas of an underlying layer when viewed on a cross-section. The method may include forming first seed layer patterns and second seed layer patterns which are disposed in the areas and are separated from each other, over the underlying layer having the height difference. The method may include forming the main bumps and the support bumps of which final heights are the same when viewed on the cross-section in the areas, by performing electroplating through using, as electrodes, the first seed layer patterns and the second seed layer patterns which are disposed in the areas and are separated from each other, under different conditions in the areas.