公开(公告)号：US20220155011A1

公开(公告)日：2022-05-19

申请号：US17510333

申请日：2021-10-25

Applicant: SPTS Technologies Limited

Inventor： Trevor THOMAS ,  Martin Ayres

IPC: F26B5/08 ,  F26B11/18 ,  F26B25/10

Abstract: A spin rinse dryer for treating a substrate has an enclosure, a rotatable support for supporting the substrate, a rotatable member located within the enclosure above the rotatable support, and a drive for rotating the rotatable member. During cleaning of the wafer, liquid that splashes up from the wafer will strike the rotatable member, rather than the upper wall of the enclosure, and may form droplets on the rotatable member. After the flow of cleaning liquid has stopped, the drive can rotate the rotatable member at high speed, which tends to throw the liquid droplets off the rotatable member through centrifugal force. The liquid then runs down the walls of the enclosure, away from the wafer, so that there is a much reduced chance of contamination of the cleaned wafer. The rotatable member and support may be integrally formed and rotated together or may be separate members.