公开(公告)号：US20240332238A1

公开(公告)日：2024-10-03

申请号：US18615286

申请日：2024-03-25

Applicant: STMicroelectronics International N.V.

Inventor： Guendalina CATALANO ,  Antonio BELLIZZI ,  Claudio ZAFFERONI

IPC: H01L23/00

CPC classification number: H01L24/19 ,  H01L24/24 ,  H01L2224/19 ,  H01L2224/24245 ,  H01L2924/18162

Abstract: Laser direct structure (LDS) material is molded onto a semiconductor chip arranged on a substrate. The LDS material has a first thickness between a front surface of the LDS material and the substrate. A portion of the LDS material is removed (with a blade, for instance) to form a cavity having an end wall between the front surface of the LDS material and an electrically conductive formation on the substrate. At the cavity, the LDS material has a second thick ness smaller than the first thickness. Laser beam energy is applied to the LDS material at the end wall of the cavity to structure therein one or more vias that extend between the end wall of the cavity and the electrically conductive formation. The semiconductor chip and the electrically conductive formation are electrically coupled with electrically conductive material grown in the one or more vias laser structured in the LDS material.