Abstract:
A semiconductor device including an electronic component and an edge region delimited by a side surface. The device is formed in a substrate of semiconductor material overlaid by a plurality of superficial layers which form, on top of the edge region, a stack of insulating layers. A first groove extends in the stack of insulating layers near the electronic component. A second groove extends in the stack of insulating layers between the first groove and the side surface and operates as an element of mechanical decoupling which blocks any possible delayering of the superficial layers during cutting of the wafer.