公开(公告)号：US20040121498A1

公开(公告)日：2004-06-24

申请号：US10657801

申请日：2003-09-08

Applicant: STMicroelectronics S.r.I.

Inventor： Camillo Bresolin ,  Valter Soncini ,  Andrea Riva

IPC: H01L021/66 ,  H01L021/336 ,  H01L021/04

CPC classification number: H01J37/3171 ,  H01J37/18 ,  H01J2237/022

Abstract: An ion-implantation machine has an implantation chamber with a vent inlet; a vacuum pump is connected to the implantation chamber through a vacuum valve. A pipe connects the vent inlet of the implantation chamber to a source of a fluid containing oxygen. The fluid containing oxygen is preferably environmental air. A flow-rate control valve is arranged on the pipe and is activated only after closing the vacuum valve.

Abstract translation: 离子注入机具有具有通气口的注入室; 真空泵通过真空阀与注入室连接。 管将注入室的排气入口连接到含有氧气的流体源。 含氧的流体优选是环境空气。 流量控制阀配置在管道上，仅在关闭真空阀后启动。