公开(公告)号：US20230130507A1

公开(公告)日：2023-04-27

申请号：US17914183

申请日：2021-03-11

Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED

Inventor： Tomohiro NAKAYAMA ,  Tetsuo AKASAKA ,  Takuma AOKI ,  Taku MIYAZAWA

IPC: G03F7/038 ,  G03F7/00

Abstract: It is an object of the present invention to provide a negative resist composition that is useful for producing a color filter with a high transmittance of light at a wavelength of 440 nm. A negative resist composition of the present invention comprises a colorant and a resin, wherein the colorant contains a xanthene dye, and a cured film formed from the negative resist composition exhibits a spectrum that satisfies the following condition 1: [condition 1] a maximum absorption wavelength is present in a wavelength range of 500 to 580 nm, and based on a transmittance at the maximum absorption wavelength being 5%, a transmittance at a wavelength of 440 nm is 80% or more and a transmittance at a wavelength of 620 nm is 80% or more.