DEPOSITION SOURCE
    1.
    发明申请

    公开(公告)号:US20240425969A1

    公开(公告)日:2024-12-26

    申请号:US18414701

    申请日:2024-01-17

    Abstract: A deposition source includes a first frame including a lower space of a first crucible, a lower space of a second crucible, and a first partition wall disposed between the lower space of the first crucible and the lower space of the second crucible; and a second frame including an upper space of the first crucible, an upper space of the second crucible, a first nozzle connected to the first crucible, a second nozzle connected to the second crucible, and a second partition wall disposed between the upper space of the first crucible and the upper space of the second crucible, wherein an exhaust passage is disposed between the first partition wall of the first frame and the second partition wall of the second frame, and the first partition wall contacts the second partition wall.

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