公开(公告)号：US20240263309A1

公开(公告)日：2024-08-08

申请号：US18479233

申请日：2023-10-02

Applicant: Samsung Display Co., Ltd.

Inventor： WOO-SEOK JEON ,  CHULMIN BAE ,  Jaehee SEO

IPC: C23C16/455 ,  C23C16/52

CPC classification number: C23C16/45544 ,  C23C16/45529 ,  C23C16/52

Abstract: An atomic layer deposition apparatus includes a source gas supply part that supplies multiple source gases, a source gas supply module connected to the source gas supply part, a reaction gas supply part that supplies a reaction gas, a reaction gas supply module connected to the reaction gas supply part and spaced apart from the source gas supply module in a first direction, and a first purge gas supply module disposed between the source gas supply module and the reaction gas supply module.