公开(公告)号：US08982326B2

公开(公告)日：2015-03-17

申请号：US13652911

申请日：2012-10-16

申请人： Samsung Display Co., Ltd.

发明人： Jong-Kwang Lee ,  Min Kang ,  Jin-Ho Ju ,  Bong-Yeon Kim

IPC分类号： G03B27/72 ,  G03F1/30 ,  G03F7/20

CPC分类号： G03F7/70575 ,  G03F1/30 ,  G03F7/70283

摘要： An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate.

摘要翻译： 曝光系统包括曝光装置和相移掩模。 曝光装置发射包括彼此不同的多个波长的多波长光。 相移掩模包括透明基板和遮光层。 透明基板包括第一表面和与第一表面相对的第二表面。 多波长光入射到第一表面。 透明基板还包括从第二表面朝向第一表面延伸的凹槽。 遮光层包括暴露透明基板的第二表面的第一开口和与第一开口间隔开并暴露透明基板的凹部的第二开口。