公开(公告)号：US20180340258A1

公开(公告)日：2018-11-29

申请号：US15990051

申请日：2018-05-25

Applicant: Samsung Display Co., Ltd.

Inventor： Jaihyuk CHOI ,  Jong-hoon PARK ,  Kyungjoo MIN ,  Wonwoong PARK ,  Sukwon JUNG ,  Hyunwoo JOO ,  Myungsoo HUH

IPC: C23C16/50 ,  C23C16/458 ,  H01J37/32

Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a down-side surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.