公开(公告)号：US20210350514A1

公开(公告)日：2021-11-11

申请号：US17235200

申请日：2021-04-20

Applicant: Samsung Display Co., LTD. ,  HIMS CO., LTD.

Inventor： Sangdon Hwang ,  BongSuk Kim ,  TaeHyun Kim ,  Mihye Kwon ,  Ilha Song ,  Jimin Woo

IPC: G06T7/00 ,  G01N21/956

Abstract: A mask inspection method including the steps of obtaining an image of a mask including a first region having a plurality of first openings, and a second region having a plurality of second openings, sectioning the image into a first partial image corresponding to the first region and a second partial image corresponding to the second region, respectively, inspecting the first region of the mask based on the first partial image, and inspecting the second region of the mask based on the second partial image.

公开(公告)号：US12045975B2

公开(公告)日：2024-07-23

申请号：US17362123

申请日：2021-06-29

Applicant: Samsung Display Co., Ltd.

Inventor： Ilha Song ,  Mihye Kwon ,  Jimin Woo ,  Sangdon Hwang

IPC: G06T7/00 ,  G01N21/956 ,  G06T7/11

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G06T7/11 ,  G01N2021/95615 ,  G01N2021/95676 ,  G06T2207/30148

Abstract: A mask inspection method includes photographing a cell mask through which openings is formed to obtain an image, setting an area of the image adjacent to an edge of the cell mask as an inspection area, comparing a grayscale of the openings in the inspection area with a reference grayscale, and checking a defect of the cell mask according to a result of the comparing of the grayscale of the openings.

公开(公告)号：US11961222B2

公开(公告)日：2024-04-16

申请号：US17235200

申请日：2021-04-20

Applicant: Samsung Display Co., LTD. ,  HIMS CO., LTD.

Inventor： Sangdon Hwang ,  BongSuk Kim ,  TaeHyun Kim ,  Mihye Kwon ,  Ilha Song ,  Jimin Woo

IPC: G06T7/00 ,  G01N21/956

CPC classification number: G06T7/001 ,  G01N21/956 ,  G06T2207/30108

Abstract: A mask inspection method including the steps of obtaining an image of a mask including a first region having a plurality of first openings, and a second region having a plurality of second openings, sectioning the image into a first partial image corresponding to the first region and a second partial image corresponding to the second region, respectively, inspecting the first region of the mask based on the first partial image, and inspecting the second region of the mask based on the second partial image.