DEPOSITION APPARATUS AND DEPOSITION METHOD USING DEPOSITION APPARATUS

    公开(公告)号:US20190226084A1

    公开(公告)日:2019-07-25

    申请号:US16254699

    申请日:2019-01-23

    Abstract: A deposition apparatus includes: a vacuum chamber in which a deposition process is performable; connected to the vacuum chamber: vaporizers in which are vaporizable different deposition materials; and a mixing chamber in which the vaporized different deposition materials are mixable; and within the vacuum chamber: a substrate support on which is supportable a substrate on which the mixed vaporized different deposition materials are deposited in the deposition process; and a spray nozzle which is connected to the mixing chamber and from which the mixed vaporized different deposition materials are sprayable to the substrate in the deposition process. The spray nozzle includes nozzles arranged in a plurality of lines.

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