Mask for depositing a thin film and a thin film deposition method using the same
    2.
    发明授权
    Mask for depositing a thin film and a thin film deposition method using the same 有权
    用于沉积薄膜的掩模和使用其的薄膜沉积方法

    公开(公告)号:US09375752B2

    公开(公告)日:2016-06-28

    申请号:US14151211

    申请日:2014-01-09

    Inventor: Woong-Sik Kim

    CPC classification number: B05B12/29 B05D1/32 C23C14/042

    Abstract: A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern pars to a plurality of positions to modify the deposition pattern.

    Abstract translation: 公开了一种用于沉积薄膜的掩模和使用其的薄膜沉积方法。 掩模包括设置在框架上的图案条。 图案条可移动并且位置以形成沉积图案。 掩模包括图案修改机构,其配置为将图案片段移动到多个位置以修改沉积图案。

    Organic light emitting diode display and method for manufacturing the same
    3.
    发明授权
    Organic light emitting diode display and method for manufacturing the same 有权
    有机发光二极管显示器及其制造方法

    公开(公告)号:US09029865B2

    公开(公告)日:2015-05-12

    申请号:US14140729

    申请日:2013-12-26

    CPC classification number: H01L27/3248 H01L27/3244 H01L51/5228 H01L2251/5315

    Abstract: An organic light emitting diode display includes a substrate, a first electrode and an assistance electrode disposed on the substrate and separated from each other, an organic emission layer disposed on the first electrode, a contact hole which exposes the assistance electrode and is defined in the organic emission layer, and a second electrode disposed on the organic emission layer and electrically connected to the assistance electrode through the contact hole.

    Abstract translation: 有机发光二极管显示器包括基板,第一电极和辅助电极,设置在基板上并彼此分离,设置在第一电极上的有机发射层,暴露辅助电极并被界定在接触孔中的接触孔 有机发光层和设置在有机发光层上的第二电极,并通过接触孔与辅助电极电连接。

    MASK FOR DEPOSITING A THIN FILM AND A THIN FILM DEPOSITION METHOD USING THE SAME
    4.
    发明申请
    MASK FOR DEPOSITING A THIN FILM AND A THIN FILM DEPOSITION METHOD USING THE SAME 有权
    用于沉积薄膜的掩模和使用其的薄膜沉积方法

    公开(公告)号:US20140370196A1

    公开(公告)日:2014-12-18

    申请号:US14151211

    申请日:2014-01-09

    Inventor: Woong-Sik Kim

    CPC classification number: B05B12/29 B05D1/32 C23C14/042

    Abstract: A mask for depositing a thin film and a thin film deposition method using the same are disclosed. The mask includes pattern bars disposed on a frame. The pattern bars are moveable and are position to form a deposition pattern. The mask includes a pattern modification mechanism configured to move the pattern pars to a plurality of positions to modify the deposition pattern.

    Abstract translation: 公开了一种用于沉积薄膜的掩模和使用其的薄膜沉积方法。 掩模包括设置在框架上的图案条。 图案条可移动并且位置以形成沉积图案。 掩模包括图案修改机构,其配置为将图案片段移动到多个位置以修改沉积图案。

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