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公开(公告)号:US20250166266A1
公开(公告)日:2025-05-22
申请号:US18949390
申请日:2024-11-15
Applicant: Samsung Display Co., Ltd.
Inventor: Zhihong Pan , Rahul Shenoy , Kaushik Balakrishnan , Qisen Cheng , Janghwan Lee
Abstract: A system and a method are disclosed for defect image generation using diffusion model sampling. The method includes generating, by a processor via a diffusion model, a noisy image from a defect-free image, generating, by the processor via the diffusion model, a sampled defect image and a sampled defect-free image from the noisy image, generating, by the processor, a mask based on the sampled defect image and the sampled defect-free image, generating, by the processor, a synthetic defect image by generating an additional sampled defect image based on the noisy image and the mask, and transmitting, by the processor, the synthetic defect image.