公开(公告)号：US20150131891A1

公开(公告)日：2015-05-14

申请号：US14331899

申请日：2014-07-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ki-Hyun KIM ,  Kai-Yuan CHI ,  Dmitry VENGERTSEV ,  Seung-Hune YANG

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: Provided is a method of detecting a defect of a pattern using vectorization to increase accuracy and efficiency in OPC modeling and OPC verification. The method includes acquiring a target layout image associated with a target pattern, acquiring a pattern image associated with a pattern formed on a substrate, extracting an edge image from the pattern image, producing a first vector form based on the target layout image, producing a second vector form based on the edge image, and comparing the first vector form with the second vector form.

Abstract translation: 提供了一种使用向量化来检测图案的缺陷以提高OPC建模和OPC验证中的精度和效率的方法。 该方法包括获取与目标图案相关联的目标布局图像，获取与形成在基板上的图案相关联的图案图像，从图案图像中提取边缘图像，基于目标布局图像产生第一矢量形状， 基于边缘图像的第二矢量形式，并且将第一矢量形式与第二矢量形式进行比较。