公开(公告)号：US20200150062A1

公开(公告)日：2020-05-14

申请号：US16437468

申请日：2019-06-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： HYON-SEOK SONG ,  In-Yong Kang ,  Il-Yong Jang

IPC: G01N23/2251 ,  G01B15/00 ,  G03F7/20

Abstract: Mask inspection apparatuses and/or mask inspection methods are provided that enable quick and accurate inspection of a registration of a pattern on a mask while a defect of the mask and the registration of the pattern are inspected simultaneously. The mask inspection apparatus may include a stage configured to receive a mask for inspection; an e-beam array including a plurality of e-beam irradiators configured to irradiate e-beams to the mask and detectors configured to detect electrons emitted from the mask; and a processor configured to process signals from the detectors. A defect of the mask may be detected through processing of the signal and registrations of patterns on the mask may be inspected based on positional information regarding the e-beam irradiators.