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公开(公告)号:US11531277B2
公开(公告)日:2022-12-20
申请号:US17499182
申请日:2021-10-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jihoon Na , Sungho Kang , Jaewhan Sung , Hak-Seok Lee , Hyunjune Cho
Abstract: An EUV mask inspection system includes a mask receiving unit configured to receive a manufactured EUV mask, a main chamber configured to perform an inspection on the EUV mask, and a load-lock chamber disposed between the mask receiving unit and the main chamber. The load-lock chamber includes a mask table for loading the EUV mask, an UV lamp disposed adjacent the mask table in a first direction, a cold trap disposed adjacent the mask table in a second direction, and a vacuum pump. The first direction is a direction perpendicular to a sidewall of the mask table, and the second direction is a direction perpendicular to a top surface of the mask table. The UV lamp is configured to evaporate water molecules on the EUV mask by irradiating UV light onto the EUV mask. The cold trap is configured to trap the water molecules evaporated from the EUV mask.
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公开(公告)号:US20220283519A1
公开(公告)日:2022-09-08
申请号:US17499182
申请日:2021-10-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jihoon Na , Sungho Kang , Jaewhan Sung , Hak-Seok Lee , Hyunjune Cho
Abstract: An EUV mask inspection system includes a mask receiving unit configured to receive a manufactured EUV mask, a main chamber configured to perform an inspection on the EUV mask, and a load-lock chamber disposed between the mask receiving unit and the main chamber. The load-lock chamber includes a mask table for loading the EUV mask, an UV lamp disposed adjacent the mask table in a first direction, a cold trap disposed adjacent the mask table in a second direction, and a vacuum pump. The first direction is a direction perpendicular to a sidewall of the mask table, and the second direction is a direction perpendicular to a top surface of the mask table. The UV lamp is configured to evaporate water molecules on the EUV mask by irradiating UV light onto the EUV mask. The cold trap is configured to trap the water molecules evaporated from the EUV mask.
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