公开(公告)号：US20220365415A1

公开(公告)日：2022-11-17

申请号：US17874783

申请日：2022-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seulgi KIM ,  Hyonseok SONG ,  Inyong KANG ,  Kangwon LEE ,  JuHyoung LEE ,  Eunsik JANG

IPC: G03F1/22 ,  G03F7/20 ,  H01L21/66 ,  H01L21/027

Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.

公开(公告)号：US20210033958A1

公开(公告)日：2021-02-04

申请号：US16800316

申请日：2020-02-25

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seulgi KIM ,  Hyonseok SONG ,  lnyong KANG ,  Kangwon LEE ,  JuHyoung LEE ,  Eunsik JANG

IPC: G03F1/22 ,  H01L21/027 ,  H01L21/66 ,  G03F7/20

Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.