公开(公告)号：US20240152058A1

公开(公告)日：2024-05-09

申请号：US18337982

申请日：2023-06-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Wonki LEE ,  Hyoungsoo KIM ,  Junill RYU ,  Namil KOO ,  Jongmin YOON ,  Suhwan PARK ,  Sangyeon OH ,  Gilgu LEE

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70883

Abstract: An immersion lithographic system may include a wafer stage configured to support a wafer, a projection optical system on the wafer stage and configured to irradiate light toward the wafer, a liquid supply unit configured to supply a liquid between the wafer stage and the projection optical system to form an immersion lens through which the light is transmitted, and a vapor supply unit configured to supply vapors to the immersion lens. The immersion lens and the vapor supply unit may be aligned in a vertical direction.