公开(公告)号：US20240193755A1

公开(公告)日：2024-06-13

申请号：US18526242

申请日：2023-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungkee CHOI ,  Noyoung CHUNG

IPC: G06T7/00 ,  G06T7/11

CPC classification number: G06T7/0006 ,  G06T7/11 ,  G01N2223/401 ,  G01N2223/611 ,  G06T2207/10061 ,  G06T2207/20021 ,  G06T2207/30148

Abstract: A pattern defect inspection device includes an inspection apparatus inspecting a pattern on a substrate, a database storing a pattern layout including a plurality of defect patterns from the inspection apparatus, a preset field of view (FOV) size, and a target measurement number, and a processor setting a plurality of inspection regions of the inspection apparatus based on the pattern layout, wherein the processor includes a defect search unit searching for a region defect pattern existing in any one of a plurality of inspection regions in the pattern layout, an inspection region aligning unit arranging the plurality of inspection regions based on the region defect pattern, an overlapping region removal unit removing an overlapping region from the plurality of inspection regions, and an inspection region selecting unit selecting an inspection region other than the overlapping region, among the plurality of inspection regions, as a final inspection region.

公开(公告)号：US20230253267A1

公开(公告)日：2023-08-10

申请号：US18149974

申请日：2023-01-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jungkee CHOI ,  Sangwoo PARK ,  Woonhyuk CHOI

IPC: H01L21/66

CPC classification number: H01L22/12 ,  H01L22/34

Abstract: A semiconductor device may include a metal pattern in a device region of a substrate, and a macro pattern structure in a scribe lane region of the substrate. The macro pattern structure may include a plurality of types of macro patterns. Each type of macro pattern may include a color 1 pattern and a color 2 pattern adjacent to the color 1 pattern. The color 1 pattern and the color 2 pattern may include conductive lines extending in a first direction parallel to a surface of the substrate. The color 1 pattern and color 2 pattern may be alternately arranged in a second direction perpendicular to the first direction and parallel to the surface of the substrate.