公开(公告)号：US20170256070A1

公开(公告)日：2017-09-07

申请号：US15409922

申请日：2017-01-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Woongkyu Son ,  Sangkyo Lim ,  Sunhee Shim ,  MiJung Jeon

IPC: G06T7/62 ,  G06T7/00

CPC classification number: G06T7/62 ,  G06T5/003 ,  G06T5/50 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/10148 ,  G06T2207/20016 ,  G06T2207/20221 ,  G06T2207/30148

Abstract: A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.

公开(公告)号：US11183363B2

公开(公告)日：2021-11-23

申请号：US16821249

申请日：2020-03-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yongmin Cho ,  Taeyong Lee ,  Sangkyo Lim

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22 ,  H01J37/21 ,  H01J37/20

Abstract: A scanning electron microscope apparatus including an electron gun configured to generate an electron beam, a focusing lens configured to concentrate the electron beam from the electron gun, an electron detector configured to detect signals emitted from a sample in response to the electron beam incident on the sample, a stage configured to receive the sample thereon, and a focus calibration structure on an upper part of the stage.

公开(公告)号：US10198827B2

公开(公告)日：2019-02-05

申请号：US15409922

申请日：2017-01-19

Applicant: Samsung Electronics Co., Ltd.

Inventor： Woongkyu Son ,  Sangkyo Lim ,  Sunhee Shim ,  MiJung Jeon

IPC: G06T7/62 ,  G06T7/00 ,  G06T5/00 ,  G06T5/50

Abstract: A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.