公开(公告)号：US20060063472A1

公开(公告)日：2006-03-23

申请号：US11228214

申请日：2005-09-19

申请人： Satoshi Matsumoto ,  Yuichi Kurimoto

发明人： Satoshi Matsumoto ,  Yuichi Kurimoto

IPC分类号： B24B51/00 ,  B24B1/00

CPC分类号： B24B37/015

摘要： In a method for polishing a substrate, a substrate placed on a polishing pad bonded onto a platen is polished while the temperature of a surface of the polishing pad is monitored. An index of the amount of the substrate polished is calculated based on the monitored temperature of the polishing pad surface. When the calculated index of the amount of the substrate polished is below a previously set value, the substrate is detected as an abnormally polished substrate.

摘要翻译： 在抛光基板的方法中，抛光在抛光垫的表面温度被监测时，放置在粘贴在压板上的抛光垫上的基板。 基于抛光垫表面的监测温度计算抛光的基底的量的指数。 当抛光的基板的量的计算的指数低于预先设定的值时，基板被检测为异常抛光的基板。

公开(公告)号：US07090563B2

公开(公告)日：2006-08-15

申请号：US11233053

申请日：2005-09-23

申请人： Satoshi Matsumoto ,  Yuichi Kurimoto

发明人： Satoshi Matsumoto ,  Yuichi Kurimoto

IPC分类号： B24B1/00

CPC分类号： B24B53/017 ,  B24B49/16

摘要： A polishing method includes the steps of: (a) polishing a to-be-polished object by moving an abrasive cloth relative to the to-be-polished object while pressing the to-be-polished object against the abrasive cloth; and (b) pressing a dressing member against the abrasive cloth moving relative to the to-be-polished object with the to-be-polished object pressed against the abrasive cloth and relatively moving the abrasive cloth and the dressing member, thereby dressing the abrasive cloth while polishing the to-be-polished object. The difference between the torque current of a motor in the step (a) and the torque current of the motor in the step (b) is determined, and when the determined difference falls below a previously set value is detected.

摘要翻译： 抛光方法包括以下步骤：（a）通过相对于待抛光物体移动研磨布而将被抛光物体压在研磨布上的同时抛光被抛光物体; 和（b）将修整构件压靠在相对于待抛光物体移动的研磨布上，待磨光的物体压靠研磨布并相对移动磨料和修整构件，从而修整磨料 在抛光被抛光物体时布。 确定步骤（a）中的电动机的转矩电流与步骤（b）中的电动机的转矩电流之间的差异，并且当确定的差值低于预先设定的值时被检测。

公开(公告)号：US20060073769A1

公开(公告)日：2006-04-06

申请号：US11233053

申请日：2005-09-23

申请人： Satoshi Matsumoto ,  Yuichi Kurimoto

发明人： Satoshi Matsumoto ,  Yuichi Kurimoto

IPC分类号： B24B49/00 ,  B24B1/00

CPC分类号： B24B53/017 ,  B24B49/16

摘要： A polishing method includes the steps of: (a) polishing a to-be-polished object by moving an abrasive cloth relative to the to-be-polished object while pressing the to-be-polished object against the abrasive cloth; and (b) pressing a dressing member against the abrasive cloth moving relative to the to-be-polished object with the to-be-polished object pressed against the abrasive cloth and relatively moving the abrasive cloth and the dressing member, thereby dressing the abrasive cloth while polishing the to-be-polished object. The difference between the torque current of a motor in the step (a) and the torque current of the motor in the step (b) is determined, and when the determined difference falls below a previously set value is detected.