公开(公告)号：US20150187373A1

公开(公告)日：2015-07-02

申请号：US14140815

申请日：2013-12-26

Applicant: Seagate Technology LLC

Inventor： Denis O'Donnell ,  John Rooney ,  Thomas McLaughlin

IPC: G11B5/11

CPC classification number: G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

Abstract: Methods for fabricating a shield structure for a pole tip of a write element for magnetic recording are disclosed. In illustrated embodiments disclosed, a side shield deposition is etched below a front edge surface of the pole tip and one or more depositions are deposited on the etched side shield deposition to form a side shield structure having an extended gap region to enhance performance of the write element. In illustrated embodiments, multiple gap depositions are deposited to form the extended gap region and side shield structure. One or both of the multiple gap depositions are etched to remove outer portions of the deposition prior to depositing the front shield structure.

Abstract translation: 公开了用于制造用于磁记录的写入元件的极尖的屏蔽结构的方法。 在所公开的图示实施例中，在极尖的前边缘表面下方蚀刻侧屏蔽沉积，并且在蚀刻的侧屏蔽沉积上沉积一个或多个沉积物以形成具有扩展间隙区域的侧屏蔽结构，以增强写入的性能 元件。 在所示实施例中，沉积多个间隙沉积以形成延伸的间隙区域和侧面屏蔽结构。 在沉积前屏蔽结构之前，蚀刻多个间隙沉积中的一个或两个以去除沉积物的外部部分。