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公开(公告)号:US20250044640A1
公开(公告)日:2025-02-06
申请号:US18625155
申请日:2024-04-02
Applicant: Shanghai Tianma Micro-electronics Co., Ltd.
Inventor: Xiongping LI , Ronghua LI , Hui LIU
IPC: G02F1/13357 , G02F1/1335
Abstract: A direct-lit backlight module, a method of designing a backlight module and a display device are provided. The direct-light backlight module includes a substrate; an optical film layer; a reflector; and light-emitting elements. The substrate and the optical film layer are arranged oppositely; the light-emitting elements are arranged on a side of the substrate facing the optical film layer; the reflector is located between the substrate and the optical film layer and includes reflective structures surrounding the light-emitting elements; there is a gap between the reflective structures and the optical film layer, and there is air in the gap. In the thickness direction of the backlight module, a distance between one end of the reflective structure adjacent to the optical film layer and the optical film layer is OD1, and the distance between the substrate and the optical film layer is OD; and X = OD 1 OD ; and 0.4≤X
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公开(公告)号:US20240142821A1
公开(公告)日:2024-05-02
申请号:US18408816
申请日:2024-01-10
Applicant: Shanghai Tianma Micro-Electronics Co., Ltd.
Inventor: Chunfeng LIU , Ronghua LI
IPC: G02F1/13357
CPC classification number: G02F1/133606 , G02F1/133603 , G02F1/133608
Abstract: The present disclosure relates a backlight module and a display device to improve surface uniformity of the backlight module. The backlight module includes: a first region and a second region surrounding the first region; a backplate; a light source located at a side of the backplate pointing to a light exiting direction of the backlight module and also located in the first region; and a first structure located at a side of the light source away from the backplate, where the first structure includes scattering dots; where the scattering dots are located in the first region and the second region, and within a unit projected area, an area of orthographic projection of the scattering dots in the first region is smaller than an area of orthographic projection of the scattering dots in the second region, or the scattering dots are located in the second region.
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