METHOD AND APPARATUS FOR COMPENSATED ILLUMINATION FOR ADVANCED LITHOGRAPHY
    1.
    发明申请
    METHOD AND APPARATUS FOR COMPENSATED ILLUMINATION FOR ADVANCED LITHOGRAPHY 失效
    用于高级光刻的补偿照明的方法和装置

    公开(公告)号:US20070291244A1

    公开(公告)日:2007-12-20

    申请号:US11424173

    申请日:2006-06-14

    IPC分类号: G03B27/54

    CPC分类号: G03F7/701

    摘要: Disclosed is a lithography system. The lithography system includes a source designed to provide energy; an imaging system configured to direct the energy onto a substrate to form a predefined image thereon, and defining an optical axis; and an aperture incorporated with the imaging system, the aperture having a plurality of transmitting regions defined along radial axis not parallel to the optical axis, and each transmitting region operable to transmit the energy with adjustable intensity.

    摘要翻译: 公开了一种光刻系统。 光刻系统包括设计用于提供能量的源; 成像系统,被配置为将能量引导到衬底上以在其上形成预定图像,并且限定光轴; 以及与成像系统结合的孔,所述孔具有沿着不平行于光轴的径向轴线限定的多个透射区域,并且每个透射区域可操作以以可调节的强度透射能量。