公开(公告)号：US06780223B2

公开(公告)日：2004-08-24

申请号：US10197811

申请日：2002-07-19

申请人： Shu-Sung Lin ,  Hsin-Hsien Wu ,  Ching-Chih Lai

发明人： Shu-Sung Lin ,  Hsin-Hsien Wu ,  Ching-Chih Lai

IPC分类号： B01D5314

CPC分类号： B01D53/1425 ,  B01D53/1487

摘要： A method and apparatus for treating an exhaust gas containing volatile organic compounds. The method includes the steps of: introducing an exhaust gas into a wet scrubber, so that the organic pollutants in the exhaust gas are absorbed by a scrubbing water; pumping the scrubbing water containing the organic pollutants into at least one oxidation tank, thereby causing oxidation reaction between the organic pollutants and an oxidizing agents containing ozone; and introducing the scrubbing water after the oxidation reaction into the wet scrubber. The oxidizing agent further comprises hydrogen peroxide.

摘要翻译： 一种处理含有挥发性有机化合物的废气的方法和装置。 该方法包括以下步骤：将废气引入湿式洗涤器中，使废气中的有机污染物被洗涤水吸收; 将含有有机污染物的洗涤水泵入至少一个氧化槽，从而引起有机污染物与含有臭氧的氧化剂之间的氧化反应; 并将氧化反应后的洗涤水引入湿式洗涤器中。 氧化剂还包含过氧化氢。

公开(公告)号：US06911190B2

公开(公告)日：2005-06-28

申请号：US10745717

申请日：2003-12-24

申请人： Shu-Sung Lin ,  Ching-Chih Lai

发明人： Shu-Sung Lin ,  Ching-Chih Lai

IPC分类号： A61L9/00 ,  B01D53/86 ,  B01J8/02 ,  G05D21/02 ,  C07C11/24

CPC分类号： G05D21/02 ,  A61L9/00 ,  B01D53/8603 ,  B01D53/8668 ,  B01D53/8696 ,  B01D2251/104 ,  B01D2257/2064 ,  B01D2257/708 ,  B01J8/025 ,  B01J2208/00628 ,  B01J2219/00202 ,  B01J2219/00213 ,  B01J2219/00231

摘要： The present invention provides a process and apparatus for treating contaminated gas. A contaminated gas containing volatile organic compounds is continuously introduced into a reactor to allow the gas to contact a metal oxide catalyst and an oxidant for a period of time. The concentration of the volatile organic compounds can be thus reduced. The treated gas is then continuously emitted from the reactor. The concentration of the organic compounds of the emitted gas and/or the concentration of the oxidant are continuously monitored, and the oxidant feeding amount is controlled according to the monitored concentration. By means of the process of the present invention, volatile organic compound-containing waste gas with high humidity can be effectively treated, and the utility rate of the oxidant can be increased.

摘要翻译： 本发明提供一种处理污染气体的方法和装置。 将含有挥发性有机化合物的污染气体连续引入反应器中，以允许气体与金属氧化物催化剂和氧化剂接触一段时间。 因此可以减少挥发性有机化合物的浓度。 然后将经处理的气体从反应器中连续排出。 连续监测排出气体的有机化合物浓度和/或氧化剂浓度，根据监测浓度控制氧化剂供给量。 通过本发明的方法，可以有效地处理具有高湿度的含挥发性有机化合物的废气，并且可以提高氧化剂的利用率。

公开(公告)号：US5755977A

公开(公告)日：1998-05-26

申请号：US675197

申请日：1996-07-03

申请人： Mirat D. Gurol ,  Shu-Sung Lin

发明人： Mirat D. Gurol ,  Shu-Sung Lin

IPC分类号： B01D53/86 ,  C02F1/72

CPC分类号： B01D53/8662 ,  C02F1/722 ,  C02F1/725 ,  B01D2255/20738 ,  B01D2257/2064

摘要： A contaminated fluid such as water or a gas stream containing at least one organic contaminant is contacted in a continuous process with a particulate geothite catalyst in a reactor in the presence of hydrogen peroxide or ozone or both to decompose the organic contaminants.

摘要翻译： 污染的流体如水或含有至少一种有机污染物的气流在过氧化氢或臭氧或二者的存在下在反应器中与颗粒地硫酸盐催化剂以连续方法接触以分解有机污染物。

公开(公告)号：US06838065B2

公开(公告)日：2005-01-04

申请号：US10425601

申请日：2003-04-30

申请人： Shu-Sung Lin ,  Bao-chang Lin ,  Hsin-Hsien Wu

发明人： Shu-Sung Lin ,  Bao-chang Lin ,  Hsin-Hsien Wu

IPC分类号： B01D53/86 ,  B01J23/745 ,  A62D3/00

CPC分类号： B01D53/8662 ,  B01D53/8659 ,  B01D2251/104 ,  B01J23/745 ,  Y02C20/30

摘要： A method for treating waste gas containing PFC and/or HFC, comprising contacting a mixture of gas waste containing PFC and/or HFC, ozone, and water with an iron oxide catalyst at a temperature between 50 and 300° C. by gas-solid contact to perform an oxidation reaction for reducing the amount of PFC and/or HFC. An apparatus for treating waste gas containing PFC or HFC is also provided. The operational temperature in the present invention is much lower than the prior art, and thus provides lower energy consumption and little risk of fire. The present invention is suitable for the treatment of waste gas containing PFC and/or HFC, especially for the removal of perfluorocompounds from the waste gas generated by semiconductor and photoelectrical product manufacturing plants.

摘要翻译： 一种用于处理含有PFC和/或HFC的废气的方法，包括在50至300℃的温度下，通过气固固体将含PFC和/或HFC，臭氧和水的废气混合物与氧化铁催化剂接触 接触以进行氧化反应以减少PFC和/或HFC的量。 还提供了一种用于处理含有PFC或HFC的废气的设备。 本发明的操作温度远低于现有技术，因此提供了较低的能量消耗和较小的火灾风险。 本发明适用于处理含有PFC和/或HFC的废气，特别是用于从半导体和光电产品制造厂产生的废气中除去全氟化合物。