公开(公告)号：US20060219943A1

公开(公告)日：2006-10-05

申请号：US11392130

申请日：2006-03-29

Applicant: Siaudeau Jean-Louis

Inventor： Siaudeau Jean-Louis

IPC: G01N23/00

CPC classification number: H01L21/681 ,  H01L21/67259 ,  H01L21/67282 ,  H01L21/68 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54433 ,  H01L2223/54473 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method and a system of alignment of an integrated circuit chip pick-and-place equipment with an origin of a wafer supporting these circuits, comprising optically searching on the wafer at least one reference pattern formed, on manufacturing of the integrated circuits, in a reference chip, the reference pattern being different from optically-recognizable patterns of the other chips.