Substrate cleaning apparatus and substrate cleaning method using the same
    1.
    发明申请
    Substrate cleaning apparatus and substrate cleaning method using the same 有权
    基板清洗装置及使用其的基板清洗方法

    公开(公告)号:US20080066780A1

    公开(公告)日:2008-03-20

    申请号:US11898236

    申请日:2007-09-11

    Applicant: Sinji Ueebisu

    Inventor: Sinji Ueebisu

    CPC classification number: B08B1/00 B08B1/02 B08B1/04

    Abstract: Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becomes larger from an end potion of the roll brush to a central portion thereof.

    Abstract translation: 公开了一种基板清洗装置,其特征在于,具备通过使与所述基板的表面接触的辊刷清洗基板的刷清洁单元和输送所述基板的输送单元。 辊刷包括刷毛。 辊刷的直径,刷毛的刚度和刷毛的密度中的至少一个从辊刷的末端部分到其中心部分变大。

    Substrate cleaning apparatus and substrate cleaning method using the same
    2.
    发明授权
    Substrate cleaning apparatus and substrate cleaning method using the same 有权
    基板清洗装置及使用其的基板清洗方法

    公开(公告)号:US07806986B2

    公开(公告)日:2010-10-05

    申请号:US11898236

    申请日:2007-09-11

    Applicant: Sinji Ueebisu

    Inventor: Sinji Ueebisu

    CPC classification number: B08B1/00 B08B1/02 B08B1/04

    Abstract: Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becomes larger from an end portion of the roll brush to a central portion thereof.

    Abstract translation: 公开了一种基板清洗装置,其特征在于,具备通过使与所述基板的表面接触的辊刷清洗基板的刷清洁单元和输送所述基板的输送单元。 辊刷包括刷毛。 辊刷的直径,刷毛的刚度和刷毛的密度中的至少一个从辊刷的端部到其中心部分变大。

Patent Agency Ranking