公开(公告)号：US20070273855A1

公开(公告)日：2007-11-29

申请号：US11757565

申请日：2007-06-04

申请人： Soon Ho Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

发明人： Soon Ho Kim ,  Seongyong Moon ,  Jinhong Park ,  Seongwoon Choi

IPC分类号： G03B27/42

CPC分类号： G03F7/70191 ,  G02B5/1871 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0938 ,  G02B27/46 ,  G03F1/50

摘要： A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces, and the pattern of radiation blocking regions may be on at least one of the first and/or second surfaces of the transparent substrate. Moreover, the pattern of radiation blocking regions may define a pattern to be transferred to the integrated circuit substrate. The array of shadowing elements may be provided within the transparent substrate between the first and second opposing surfaces wherein a shadowing element of the array has a light transmittance characteristic different than that of an adjacent portion of the transparent substrate. Moreover, a transmittance of the patterning radiation through a portion of the transparent substrate including the array of shadowing elements may be greater than approximately 20%. Related methods and systems are also discussed.

摘要翻译： 用于使用图案化辐射来图案化集成电路器件的光掩模可以包括透明衬底，辐射阻挡区域的图案，辐射阻挡区域阵列以及阴影元件阵列。 透明基板可以具有第一和第二相对表面，并且辐射阻挡区域的图案可以在透明基板的第一和/或第二表面中的至少一个上。 此外，辐射阻挡区域的图案可以限定要传送到集成电路基板的图案。 阴影元件阵列可以设置在第一和第二相对表面之间的透明基板内，其中阵列的阴影元件具有与透明基板的相邻部分不同的透光特性。 此外，通过包括阴影元件阵列的透明基板的一部分的图案化辐射的透射率可以大于约20％。 还讨论了相关方法和系统。