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公开(公告)号:US20210336003A1
公开(公告)日:2021-10-28
申请号:US17254107
申请日:2019-01-11
Applicant: South China Normal University
Inventor: Richard Notzel , Peng Wang , Stefano Sanguinetti , Guofu Zhou
Abstract: Provided is a nanowire array, in which a plurality of nanowires are densely packed and in contact with each other via side walls to form a three-dimensional, compact layer structure, wherein the plurality of nanowires are formed from InGaN-based material. Also provided is an optoelectronic device comprising the nanowire array which is epitaxially grown on a surface of a substrate (12). Further provided are methods for preparing the nanowire array and the optoelectronic device.
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公开(公告)号:US11521852B2
公开(公告)日:2022-12-06
申请号:US17254102
申请日:2018-12-19
Applicant: South China Normal University
Inventor: Richard Notzel , Peng Wang , Stefano Sanguinetti , Guofu Zhou
Abstract: Provided are a method for preparing an InGaN-based epitaxial layer on a Si substrate (12), as well as a silicon-based InGaN epitaxial layer prepared by the method. The method may include the steps of: 1) directly growing a first InGaN-based layer (11) on a Si substrate (12); and 2) growing a second InGaN-based layer on the first InGaN-based layer (11).
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公开(公告)号:US12255231B2
公开(公告)日:2025-03-18
申请号:US17254107
申请日:2019-01-11
Applicant: South China Normal University
Inventor: Richard Notzel , Peng Wang , Stefano Sanguinetti , Guofu Zhou
Abstract: Provided is a nanowire array, in which a plurality of nanowires are densely packed and in contact with each other via side walls to form a three-dimensional, compact layer structure, wherein the plurality of nanowires are formed from InGaN-based material. Also provided is an optoelectronic device comprising the nanowire array which is epitaxially grown on a surface of a substrate (12). Further provided are methods for preparing the nanowire array and the optoelectronic device.
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公开(公告)号:US20210272802A1
公开(公告)日:2021-09-02
申请号:US17254102
申请日:2018-12-19
Applicant: South China Normal University
Inventor: Richard Notzel , Peng Wang , Stefano Sanguinetti , Guofu Zhou
IPC: H01L21/02
Abstract: Provided is a nanowire array, in which a plurality of nanowires are densely packed and in contact with each other via side walls to form a three-dimensional, compact layer structure, wherein the plurality of nanowires are formed from InGaN-based material. Also provided is an optoelectronic device comprising the nanowire array which is epitaxially grown on a surface of a substrate (12). Further provided are methods for preparing the nanowire array and the optoelectronic device.
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