公开(公告)号：US20090153954A1

公开(公告)日：2009-06-18

申请号：US12389593

申请日：2009-02-20

申请人： Stanislav SMIRNOV ,  Mark Oskotsky

发明人： Stanislav SMIRNOV ,  Mark Oskotsky

IPC分类号： G02B17/08 ,  G02B27/18 ,  G03F7/20

CPC分类号： G03B27/54 ,  G02B17/0812 ,  G03F7/70225

摘要： The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.

摘要翻译： 本发明涉及用于光刻工具的离轴反射折射投影光学系统，用于处理用于在诸如半导体晶片或平板显示器的基板上形成图像的调制光。 在一个实施例中，光学系统包括离轴镜片段，折叠镜，继电器，孔径光阑和折射透镜组。 调制光通过系统透射以在基底上形成图像。 在第二实施例中，投影系统包括离轴镜片段，孔径光阑和折射透镜组。 在第三实施例中，投影系统包括离轴镜片段，负折射透镜组，凹面镜，继电器，孔径光阑和折射透镜组。 还提供了使用包括具有离轴镜片段的投影系统作为投影光学系统中的第一元素的光刻设备的方法。