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公开(公告)号:US20230215594A1
公开(公告)日:2023-07-06
申请号:US18120905
申请日:2023-03-13
IPC分类号: G03F7/20
CPC分类号: G03F7/702 , G03F7/70033 , G03F7/70916
摘要: An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.