公开(公告)号：US20210199861A1

公开(公告)日：2021-07-01

申请号：US16623783

申请日：2019-11-12

Applicant: TCL China Star Optoelectronics Technology Co., Ltd.

Inventor： Yuanyang MA ,  Miao ZHOU

IPC: G02B5/20 ,  G03F7/00

Abstract: A method of manufacturing a color filter and a color filter are provided. The method includes steps of manufacturing a color resist layer and an inorganic barrier layer on a base substrate. The step of manufacturing the color resist layer includes sequentially forming a first color resist, a second color resist, and a third color resist, and the first color resist, the second color resist, and the third color resist are repeatedly arranged in order in a direction along a surface of the base substrate. The step of manufacturing the inorganic barrier layer includes forming a first inorganic barrier layer covering the first color resist after the first coloder resist is formed and before the second color resist is formed. By setting the inorganic barrier layer to separate different color resists, it is possible to avoid diffusion pollution between different color resists and ensure a display performance.