公开(公告)号：US20250018440A1

公开(公告)日：2025-01-16

申请号：US18548574

申请日：2023-07-18

Applicant: TCL ZHONGHUAN RENEWABLE ENERGY TECHNOLOGY CO., LTD.

Inventor： Mengcheng QU ,  Rui WU ,  Zhijun WU ,  Jingen CAO ,  Zhengping LU ,  Dongxiao ZHU ,  Wei JIANG ,  Liang YAN ,  Chunjuan CHEN ,  Xuejing MI ,  Liwei JIANG

IPC: B08B3/04 ,  B08B3/12 ,  B08B13/00

Abstract: An all-in-one wafer cleaning machine for monocrystalline silicon production includes: a circulation track disposed at a rear end of a cleaning equipment main body and fixed to the cleaning equipment main body; a horizontal moving device disposed at an outer side of the circulation track; a first motor fixedly installed at one end inside the horizontal moving device; a first transmission gear disposed at an output end of the first motor; a first fixed rod fixedly disposed at the other end of the horizontal moving device; a first fixed gear disposed at one end of the first fixed rod, wherein the first transmission gear and the first fixed gear are engaged with the circulating track; and a vertical track fixedly disposed at the horizontal moving device.