公开(公告)号：US10583517B2

公开(公告)日：2020-03-10

申请号：US15122836

申请日：2016-03-25

Applicant: TECHNOLOGY RESEARCH ASSOCIATION FOR FUTURE ADDITIVE MANUFACTURING

Inventor： Shinichi Kitamura ,  Hironobu Manabe

IPC: B23K15/00 ,  B33Y30/00 ,  B33Y40/00 ,  B22F3/105 ,  B33Y10/00 ,  B33Y50/02

Abstract: This invention effectively suppresses the generation of scattered electrons such as secondary electrons and backscattered electrons. A three-dimensional laminating and shaping apparatus includes a linear funnel that recoats a material of a three-dimensional laminated and shaped object onto a shaping surface on which the three-dimensional laminated and shaped object is to be shaped. The three-dimensional laminating and shaping apparatus also includes an electron gun that generates an electron beam. The three-dimensional laminating and shaping apparatus further includes an anti-deposition cover made of a metal and formed between the shaping surface and the electron gun. In addition, the three-dimensional laminating and shaping apparatus includes a DC power supply that applies a positive voltage to the anti-deposition cover.