GENERATING MULTI-FOCAL DEFECT MAPS USING OPTICAL TOOLS

    公开(公告)号:US20190188839A1

    公开(公告)日:2019-06-20

    申请号:US15847600

    申请日:2017-12-19

    CPC classification number: G06T7/001 G06T2207/30148

    Abstract: A method comprises obtaining a wafer comprising a plurality of components, wherein each of the plurality of components exposes a first surface of the component present in a first focal plane and a second surface of the component present in a second focal plane. The method comprises generating, by an optical tool, a first image of the first surface and a second image of the second surface of one of the plurality of components. The method comprises comparing, by a processor, the first image with a first reference image to produce a first value and the second image with a second reference image to produce a second value. The method comprises generating, by the processor, a wafer map indicating a quality state of the one of the plurality of components based on the first and second values.

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