公开(公告)号：US20230316468A1

公开(公告)日：2023-10-05

申请号：US17711685

申请日：2022-04-01

Applicant: Texas Instruments Incorporated

Inventor： Shivam Srivastava ,  Jaime De La Cruz ,  Jeffrey Kempf

IPC: G06T5/00 ,  G06T7/521 ,  G06T7/73 ,  G06T3/00 ,  G06T5/50 ,  H04N9/31

CPC classification number: G06T5/006 ,  G06T7/521 ,  G06T7/74 ,  G06T3/0093 ,  G06T3/0012 ,  G06T5/50 ,  H04N9/3147 ,  H04N9/3185 ,  H04N9/3194 ,  G06T2207/10028 ,  H04N9/3102

Abstract: An example apparatus includes: a controller configured to: generate a pattern of points; obtain a first image of a first reflection of a projection of the pattern of points from a first camera; generate a first point cloud having a first coordinate system based on the first image; obtain a second image of a second reflection of the projection of the pattern of points from a second camera; generate a second point cloud having a second coordinate system based on the second image; determine a rigid body transform to convert coordinates of the second coordinate system to coordinates of the first coordinate system; apply the rigid body transform to the second point cloud to generate a transformed point cloud; and generate a corrected point cloud based on the transformed point cloud.

公开(公告)号：US20250097391A1

公开(公告)日：2025-03-20

申请号：US18470649

申请日：2023-09-20

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Jaime De La Cruz ,  Jeffrey Kempf ,  Shivam Srivastava

IPC: H04N9/31 ,  G06T7/90 ,  H04N23/61

Abstract: A system including at least one processor configured to determine a command pattern and a projector coupled to the at least one processor. The projector is configured to project an opening pattern, project the command pattern after projecting the opening pattern, and project a closing pattern after projecting the command pattern.

公开(公告)号：US20230058081A1

公开(公告)日：2023-02-23

申请号：US17719008

申请日：2022-04-12

Applicant: Texas Instruments Incorporated

Inventor： Shashank Dabral ,  Jaime De La Cruz ,  Jeffrey Kempf

IPC: G01S17/89 ,  G01B11/25 ,  G06T7/55

Abstract: An example apparatus includes: a controller configured to: generate a symbol pattern as a result of placing symbols based on epipolar lines; instruct an SLM to project the symbol pattern; obtain an image of a reflection of the symbol pattern; determine a first location of a symbol in the image; determine a second location of the symbol in the image; and determine a depth of the symbol as based on the first location, the second location, and an essential matrix.