公开(公告)号：US20190270171A1

公开(公告)日：2019-09-05

申请号：US16320252

申请日：2017-06-29

Applicant: THINK LABORATORY CO., LTD.

Inventor： Etsuji YAMAGAMI

IPC: B24B5/04 ,  B24D7/18

Abstract: Provided are a roll polishing rotary grinding stone and a roll polishing device and method which are configured to stably perform roll polishing without making the surface roughness of a surface to be processed non-uniform by preventing polishing debris to be generated during polishing from being accumulated in a recess at a center of a polishing surface of the roll polishing rotary grinding stone body. The roll polishing rotary grinding stone includes: a rotary grinding stone body having a rotary shaft mounted on a back end face and a polishing surface formed on a front end face; and a recess formed at a center of the front end face of the rotary grinding stone body, the roll polishing rotary grinding stone being configured to perform vertical polishing with respect to a surface of a roll by bringing the polishing surface into contact with the surface of the roll, in which the recess is formed into a tapered recess in which an inner peripheral surface of the recess is increased in diameter from the back end face of the rotary grinding stone body toward the front end face of the rotary grinding stone body.