公开(公告)号：US10344382B2

公开(公告)日：2019-07-09

申请号：US14707663

申请日：2015-05-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideomi Hane ,  Takahito Umehara ,  Takehiro Kasama ,  Tsubasa Watanabe

IPC: C23C16/44 ,  C23C16/455

Abstract: There is provided a film forming apparatus including a raw material gas nozzle provided with gas discharge holes for discharging a mixed gas of a raw material gas and a carrier gas; a flow regulating plate portion extended along the longitudinal direction of the raw material gas nozzle; a central region configured to supply a separating gas from a center side within a vacuum container toward a substrate loading surface of a rotary table; a protuberance portion protruded from the flow regulating plate portion toward the rotary table at a position shifted toward a center side of the rotary table from the gas discharge holes; and a protuberance portion configured to restrain the separating gas from flowing between the flow regulating plate portion and the rotary table; and an exhaust port configured to vacuum exhaust the interior of the vacuum container.