公开(公告)号：US20220010428A1

公开(公告)日：2022-01-13

申请号：US17368242

申请日：2021-07-06

Applicant: TOKYO ELECTRON LIMITED

Inventor： Toshiki KOBAYASHI ,  Einosuke TSUDA

IPC: C23C16/458 ,  C23C16/46 ,  C23C4/134

Abstract: A substrate support is provided. The substrate support includes a main body of the substrate support that receives a heat input from at least an outside of the substrate support, a refrigerant passage provided in the main body and configured to take heat from the main body by a refrigerant, a switching mechanism that switches a position where the refrigerant is supplied to the refrigerant passage and a position where the refrigerant is discharged from the refrigerant passage between one end and the other end of the refrigerant passage in order to reverse a direction in which the refrigerant flows in the refrigerant passage, and a control unit. The control unit is configured to control the switching mechanism so as to repeatedly reverse the direction in which the refrigerant flows during a period in which the main body receives the heat input.