公开(公告)号：US20200294767A1

公开(公告)日：2020-09-17

申请号：US16810585

申请日：2020-03-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yoshinori YAMAMOTO ,  Hideomi HOSAKA ,  Naoki TAKAHASHI

IPC: H01J37/32 ,  H01J37/34 ,  C23C14/34 ,  C23C14/54

Abstract: A substrate processing apparatus for performing a predetermined processing on a substrate includes a power supply device configured to supply a DC power. The power supply device includes a power supply and a current detection unit configured to detect a current value of a DC power from the power supply. The current detection unit includes a plurality of current sensors used for detecting the current value in the current detection unit and having different detection ranges for the current value, and a switching unit configured to switch the current sensors. The power supply is controlled such that the DC power from the power supply is maintained at a set value based on a detection result of the current detection unit, and the switching unit switches the current sensors depending on the set value of the DC power from the power supply.