公开(公告)号：US20250108591A1

公开(公告)日：2025-04-03

申请号：US18977114

申请日：2024-12-11

Applicant: TOPPAN HOLDINGS INC.

Inventor： Yu TAKEUCHI ,  Hideyuki YAMAKAWA ,  Ayumi TANAKA

IPC: B32B33/00 ,  B32B7/12 ,  B32B27/08 ,  B32B27/32 ,  B32B37/24

Abstract: This multilayer film comprises: a first film that serves as a substrate film; and a coating layer that is provided on one surface of the first film, and that includes an alkoxysilane hydrolysate and an alkoxysilane dehydration-condensation reaction product. At the surface of the coating layer, the amount of SiOH+, which is obtained using time-of-flight type secondary ion mass spectrometry and standardized according to the total positive ion amount, is within a range of 0.02 to 0.07.

公开(公告)号：US20240383003A1

公开(公告)日：2024-11-21

申请号：US18787875

申请日：2024-07-29

Applicant: TOPPAN HOLDINGS INC.

Inventor： Ayumi TANAKA ,  Kaoru FURUTA ,  Mikinori YAMADA ,  Takeshi NISHIKAWA ,  Miki FUKUGAMI

IPC: B05D7/02 ,  B05D3/02 ,  B05D7/00 ,  B65D65/42 ,  C23C14/10 ,  C23C14/24

Abstract: A production method including: a step of forming, on a substrate layer containing a polypropylene resin or a polyester resin, a metal oxide layer by a vacuum film forming process; a step of applying a gas barrier coating layer-forming composition on the metal oxide layer to form a coating film; a step of preheating the coating film by infrared radiation; and a step of heating and thereby curing the coating film preheated by infrared radiation in an atmosphere at 50 to 120° C. to form a gas barrier coating layer, in which the gas barrier coating layer-forming composition contains at least one selected from the group consisting of an alkyl silicon alkoxide and its hydrolysate, and a water-soluble polymer.

公开(公告)号：US20240376280A1

公开(公告)日：2024-11-14

申请号：US18696423

申请日：2022-09-26

Applicant: TOPPAN Holdings Inc.

Inventor： Ayumi TANAKA ,  Takeshi NISHIKAWA ,  Miki FUKUGAMI

IPC: C08J7/048 ,  B29C71/02 ,  C08J7/04 ,  C08J7/043 ,  C08K3/36 ,  C08K5/5419

Abstract: A gas barrier laminated body including a base material layer including a thermoplastic resin, a metal oxide layer, and a gas barrier coating layer in this order, in which on a surface of the gas barrier coating layer, a ratio (Si/C) of silicon atoms and carbon atoms as measured by X-ray photoelectron spectroscopy is greater than 0 and less than 0.50.

公开(公告)号：US20240278546A1

公开(公告)日：2024-08-22

申请号：US18648303

申请日：2024-04-26

Applicant: TOPPAN HOLDINGS INC.

Inventor： Miki FUKUGAMI ,  Takeshi NISHIKAWA ,  Ayumi TANAKA

IPC: B32B27/08 ,  B32B27/32

CPC classification number: B32B27/08 ,  B32B27/32 ,  B32B2250/242 ,  B32B2255/10 ,  B32B2255/20 ,  B32B2255/26 ,  B32B2255/28 ,  B32B2307/538 ,  B32B2307/7244 ,  B32B2307/748 ,  B32B2553/00

Abstract: A gas barrier film includes: a substrate layer containing a polypropylene resin; a resin layer containing a copolymer of propylene and another monomer; an anchor coat layer; and a vapor deposition layer of an inorganic oxide, laminated in this order, wherein the anchor coat layer contains (meth) acrylic resin, and the anchor coat layer has a thickness of 0.1 μm to 0.7 μm. A packaging material includes the above gas barrier film, and a sealant layer containing a polypropylene resin.