公开(公告)号：US11097228B2

公开(公告)日：2021-08-24

申请号：US16497173

申请日：2018-03-23

Applicant: TORAY ADVANCED MATERIALS KOREA INC.

Inventor： Hong Sub Shin ,  Yong Doo Jung

IPC: B01D71/56 ,  B01D61/02 ,  B01D67/00 ,  B01D69/02 ,  B01D69/10 ,  B01D71/58 ,  B01D69/12

Abstract: The present invention relates to an acid-resistant nanomembrane with an improved flow rate and a method of producing the acid-resistant nanomembrane, and more particularly, to an acid-resistant nanomembrane with an improved flow rate, which can also be used under strong-acid and high-temperature conditions for the recovery of rare metals, valuable metals, and the like generated in a smelting process and which exhibits both excellent flow rate and excellent acid resistance, and a method of producing the acid-resistant nanomembrane.