公开(公告)号：US20250123543A1

公开(公告)日：2025-04-17

申请号：US18688819

申请日：2022-10-05

Applicant: TRINAMIX GMBH

Inventor： Christian BONSIGNORE ,  Peter FEJES ,  Jan David Alexander KOLOCZEK ,  Benjamin REIN

IPC: G03B21/14 ,  G01B11/25

Abstract: Disclosed herein is a method for alignment of optical components of a projector for illuminating at least one object with at least one illumination pattern including a plurality of illumination features. The projector includes at least one array of emitters. Each of the emitters is configured for generating at least one light beam. The projector includes at least one transfer device configured for generating the illumination features from the light beams impinging on the transfer device.

公开(公告)号：US20240284031A1

公开(公告)日：2024-08-22

申请号：US18685096

申请日：2022-09-19

Applicant: TRINAMIX GMBH

Inventor： Benjamin REIN ,  Jan David Alexander KOLOCZEK ,  Christian BONSIGNORE ,  Peter FEJES

IPC: H04N23/60 ,  H04N23/56

CPC classification number: H04N23/60 ,  H04N23/56

Abstract: Disclosed herein is a detector for determining a position of at least one object. The detector includes



at least one projector for illuminating at least one object with at least one illumination pattern including a plurality of illumination features;
at least one control unit configured for controlling light emission of the array areas;
at least one camera having at least one sensor element having a matrix of optical sensors, the optical sensors each having a light-sensitive area; and
at least one evaluation device configured for determining at least one longitudinal coordinate for reflection features by analysis of their respective beam profiles.

公开(公告)号：US20240410688A1

公开(公告)日：2024-12-12

申请号：US18697527

申请日：2022-11-02

Applicant: TRINAMIX GMBH

Inventor： Benjamin REIN ,  Peter FEJES ,  Christian BONSIGNORE ,  Andre SCHMIDT ,  Jan David Alexander KOLOCZEK

IPC: G01B11/25

Abstract: Disclosed herein is a projector for illuminating at least one object with at least one illumination pattern. The illumination pattern includes a plurality of illumination features, where the illumination pattern further includes at least one marker.