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公开(公告)号：US10717114B2
公开(公告)日：2020-07-21
申请号：US16360354
申请日：2019-03-21
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Kuang Teng , Yu-Xiang Lin , Tien-Zeng Fang
Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.
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Patent Agency Ranking
公开(公告)号：US10265735B2
公开(公告)日：2019-04-23
申请号：US14995305
申请日：2016-01-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Kuang Teng , Yu-Xiang Lin , Tien-Zeng Fang
Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.
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公开(公告)号：US11097318B2
公开(公告)日：2021-08-24
申请号：US16929545
申请日：2020-07-15
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Kuang Teng , Yu-Xiang Lin , Tien-Zeng Fang
Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.
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公开(公告)号：US20200338605A1
公开(公告)日：2020-10-29
申请号：US16929545
申请日：2020-07-15
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Kuang Teng , Yu-Xiang Lin , Tien-Zeng Fang
Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.
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公开(公告)号：US20190217344A1
公开(公告)日：2019-07-18
申请号：US16360354
申请日：2019-03-21
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Kuang Teng , Yu-Xiang Lin , Tien-Zeng Fang
Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.
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公开(公告)号：US20170203341A1
公开(公告)日：2017-07-20
申请号：US14995305
申请日：2016-01-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Kuang Teng , Yu-Xiang Lin , Tien-Zeng Fang
IPC: B08B9/093 , G03F7/20 , H01L21/027
Abstract: A cup wash disk for cleaning a photoresist process tool is provided. An upper plate is arranged over a lower plate to define a cavity between the upper and lower plates. The lower plate comprises peripheral openings in fluid communication with the cavity and arranged along a periphery of the lower plate. A plurality of shims is arranged between the upper and lower plates to space the upper and lower plates and to define slits between the upper and lower plates. The slits are in fluid communication with the cavity. A method for cleaning the photoresist process tool using the cup wash disk is also provided.
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