Two-Dimensional Via Pillar Structures
    2.
    发明申请

    公开(公告)号:US20190148290A1

    公开(公告)日:2019-05-16

    申请号:US16023711

    申请日:2018-06-29

    Abstract: Exemplary embodiments for various via pillar structures include one or more first conductors in a first interconnect layer of a semiconductor stack interconnected with one or more second conductors in a second interconnect layer of the semiconductor stack. The one or more first conductors and/or the one or more second conductors within the first interconnect layer and the second interconnect layer, respectively, can traverse multiple directions. In some situations, this allows multiple interconnections to be utilized to interconnect the one or more first conductors and the one or more second conductors. These multiple interconnections can reduce resistance between the one or more first conductors and the one or more second conductors thereby improving performance of signals flowing between the one or more first conductors and the one or more second conductors.

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