-
公开(公告)号：US06207332B1
公开(公告)日：2001-03-27
申请号：US08988282
申请日：1997-12-10
IPC分类号： G03G1302
CPC分类号： G03G13/28 , G03G5/10 , G03G13/02 , Y10S430/102
摘要： A process for producing a lithographic printing plate which is inexpensive, is not elongated, can be readily handled and can provide a uniform image, is disclosed. The process comprises the steps of: using an original plate for lithographic printing comprising a support having a volume electric resistance of more than 1×1010 &OHgr;·cm, a conductive layer having a volume electric resistance of 1×105 &OHgr;·cm or less, provided on one surface of the support, and a photoconductive layer containing zinc oxide and a binder, provided on the conductive layer, conducting negative corona discharge from the side of the photoconductive layer of the original plate for lithographic printing, and during this corona discharge, contacting a conductor having earth potential with at least the support of the original plate, thereby charging the photoconductive layer of the original plate for lithographic printing.
摘要翻译： 公开了一种制造廉价的未拉伸的平版印刷版的方法，可以容易地处理并且可以提供均匀的图像。 该方法包括以下步骤：使用原版平版印刷，其中包括体积电阻大于1×10 10欧米汞厘米的载体，具有体积电阻为1×10 5欧姆·厘米或更小的导电层，设置在一个表面上 的载体和包含氧化锌和粘合剂的光电导层，设置在导电层上，从用于平版印刷的原版的光电导层侧进行负电晕放电，并且在该电晕放电期间，接触具有接地的导体 至少具有原版支撑的电位，从而对原版的光电导层充电以进行平版印刷。
-
公开(公告)号：US6096485A
公开(公告)日：2000-08-01
申请号：US420396
申请日：1999-10-18
申请人： Seishi Kasai , Ryousuke Itakura , Eiichi Kato
发明人： Seishi Kasai , Ryousuke Itakura , Eiichi Kato
CPC分类号： B41N3/08
摘要： A desensitizing solution for lithographic printing is disclosed, which comprises at least one organometallic polymer containing at least two partial structure units represented by the following formula (1): ##STR1## wherein R.sup.0 represents --PO.sub.3 H.sub.2, --OPO.sub.3 H.sub.2 or a salt thereof.
摘要翻译： 公开了一种用于平版印刷的脱敏溶液，其包含至少一种含有由下式（1）表示的至少两个部分结构单元的有机金属聚合物：其中R 0表示-PO 3 H 2，-OPO 3 H 2或其盐。
-
公开(公告)号：US5730787A
公开(公告)日：1998-03-24
申请号：US802244
申请日：1997-02-19
申请人： Seishi Kasai , Ryousuke Itakura , Eiichi Kato
发明人： Seishi Kasai , Ryousuke Itakura , Eiichi Kato
IPC分类号： B41N3/08 , C07F9/6524 , G03G13/28 , G03G9/00
CPC分类号： C07F9/6524 , B41N3/08 , G03G13/28
摘要： A desensitizing solution for lithography is disclosed which contains at least one member selected from cyclic amine and ammonium compounds each containing specific structures. The desensitizing solution does not cause environmental pollution, is stable to long-term storage, continuous use, and fluctuations in environmental conditions, is effective in reducing the time required for etching treatment, and has excellent desensitization performance.
摘要翻译： 公开了一种用于光刻的脱敏溶液，其含有选自环胺和铵化合物中的至少一种，每一种都含有特定的结构。 脱敏溶液不会引起环境污染，对于长期储存，连续使用和环境条件的波动是稳定的，有效减少蚀刻处理所需的时间，并且具有优异的脱敏性能。
-
-
搜索结果
3 条记录 (耗时 0.026 秒)
