公开(公告)号：US5092975A

公开(公告)日：1992-03-03

申请号：US366783

申请日：1989-06-15

申请人： Takayoshi Yamamura ,  Yoshihisa Endo ,  Akira Shinmura

发明人： Takayoshi Yamamura ,  Yoshihisa Endo ,  Akira Shinmura

IPC分类号： C25D17/00

CPC分类号： C25D17/00

摘要： In arrangement of high speed plating system, a number of sequential treatment bath units are arranged side by side along an arcuate path at equal intervals, a rotatable transfer unit of workpieces is arranged at the center of the arcuate path to concurrently allocate different workpieces to different treatment bath units for different but concurrent treatments and loading and unloading units are annexed to the transfer unit as interfaces to adjacent systems in a continuous line of production. Arcuate arrangement of the treatment bath units well minimized space demand in a mill and use of the loading and unloading units assure easy and smooth combination of the plating system with adjacent systems.

摘要翻译： 在高速电镀系统的布置中，多个顺序处理浴单元沿着弓形路径以相等的间隔并排布置，在弧形路径的中心布置有可转动的工件传送单元，以将不同的工件分配到不同的 用于不同但同时处理和装卸单元的处理浴单元作为与生产连续生产线相邻系统的接口附接到转移单元。 处理浴缸的弧形布置可以很好地最大限度地减少了轧机的空间需求，并且使用装卸单元确保了电镀系统与相邻系统的简单和顺畅的组合。